: In this paper, we introduce an approach to increase density of field-effect transistors framework Schmitt trigger delay element. Framework the approach we consider manufacturing of the inverter in heterostructure with specific configuration. Several required areas of the heterostructure should be doped by diffusion or ion implantation. After that, dopant and radiation defects should by annealed framework by optimized scheme. We also consider an approach to decrease value of mismatch-induced stress in the considered heterostructure. We introduce an analytical approach to analyze the mass and heat transport in heterostructures during manufacturing of integrated circuits with account mismatch-induced stress.